Department of Chemistry - PhD Student Seminar - Advanced Semiconductor Patterning: Transistor Evolution, EUV Mechanisms and Emerging Resists
Supporting the below United Nations Sustainable Development Goals:支持以下聯合國可持續發展目標：支持以下联合国可持续发展目标：
Student: Mr. Chunliang LI
Department: Department of Chemistry, HKUST
Supervisor: Prof He YAN
Co-supervisor: Dr Sai Ho PUN
Abstract
The sustained scaling of microelectronic devices has been critically enabled by continuous progress in resist chemistry and exposure tools. This seminar traces the development of photoresist systems from the 365 nm wavelength through the 248 nm, 193 nm, 157 nm, and 193 nm immersion nodes, then shifts focus to the distinct challenges arising at 13.5 nm extreme ultraviolet (EUV) lithography. A comparative review follows, encompassing chemically amplified resists, metal–organic hybrids, molecular glasses, chain-scissionable materials, non‑chemically amplified systems, and dry‑deposited films. Finally, this presentation seeks to extract overarching design principles that correlate molecular architecture with lithographic performance, while also highlighting unresolved questions for future patterning technologies.