Name: MPhil in Physics - Chemical Vapor Deposition Growth of Three-Dimension Topological Insulator Bi2(SexTe1-x)3
Start: 2017-06-06
End: 2017-06-06

MPhil in Physics - Chemical Vapor Deposition Growth of Three-Dimension Topological Insulator Bi2(SexTe1-x)3

2017 年 6 月 6 日

10:00am - 11:00am

Room 4472 (Lifts 25-26), 4/F Academic Building, HKUST

活動形式

論文答辯

候選人

Mr Huanwen Wang

語言

英文

English

適合對象

教職員

本科生