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PRODID:-//HKUST Drupal Platform//EN
VERSION:2.0
BEGIN:VTIMEZONE
TZID:Asia/Hong_Kong
BEGIN:STANDARD
DTSTART:20071104T020000
TZOFFSETFROM:+0700
TZOFFSETTO:+0800
TZNAME:HKT
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BEGIN:VEVENT
DTSTAMP;TZID=Asia/Hong_Kong:20260420T202108
DTSTART;TZID=Asia/Hong_Kong:20170606T100000
DTEND;TZID=Asia/Hong_Kong:20170606T110000
LOCATION:Room 4472 (Lifts 25-26), 4/F Academic Building, HKUST
SUMMARY:MPhil in Physics - Chemical Vapor Deposition Growth of Three-Dimension Topological Insulator Bi2(SexTe1-x)3
UID:26134
END:VEVENT
END:VCALENDAR